Multi moire structured illumination microscopy with high index materials
US11105746B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2017 |
| Grant date | Aug 31, 2021 |
| Priority date | — |
| Expiry date | Sep 5, 2037 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/0638
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system comprising: a high index dielectric configured to: a) create a bi-periodic interference pattern of two standing sinusoidal waves on illumination by two pairs of counter-propagating sinusoidal light beams at different incident angles, wherein the incident angles are selected in accordance with the index of refraction of the high index dielectric to i) to 5 determine the spatial frequency of each counter-propagating light beam pair, and ii) cause total internal reflection, and b) generate, from the bi-periodic interference pattern, an evanescent bi-periodic standing sinusoidal wave; a light source configured to illuminate the high index dielectric with the two pairs of counter-propagating sinusoidal light beams at the different incident angles and thereby illuminate a fluorescing object positioned at the surface of the high index dielectric with the generated evanescent bi-periodic standing sinusoidal wave; and one or more delay lines configured to independently modify the initial phase of each counter-propagating light beam pair.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.