Patent · US Active

Methods and apparatus for laser deposition

US11110548B2 · kind B2 · utility

0Cited by

10References

20Claims

0Family size

Assignee

The Boeing Company · US

Inventors

Daniel E. Sievers · Owens Cross Roads, US
Peter J. Bocchini · Huntsville, US

Key dates

Filing date	Aug 10, 2018
Grant date	Sep 7, 2021
Priority date	—
Expiry date	Jun 5, 2039

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P10/25
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A laser deposition apparatus includes a sealed enclosure configured to hold a substrate, a powder source configured to hold a powder material, a peen source configured to hold a shot peen media, and a deposition system fluidly connected to the powder source and the peen source. The deposition system includes a laser configured to generate a laser beam. The deposition system is configured to deposit at least one layer on the substrate by injecting a stream of the powder material into the laser beam. The deposition system is configured to shot peen the at least one layer by propelling the shot peen media onto an exterior surface of the at least one layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.