Methods and compositions for electrochemical deposition of metal rich layers in aqueous solutions
US11111591B2 · kind B2 · utility
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Key dates
| Filing date | Jun 1, 2018 |
| Grant date | Sep 7, 2021 |
| Priority date | — |
| Expiry date | Feb 9, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D9/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods and compositions for electrodepositing mixed metal reactive metal layers by combining reactive metal complexes with electron withdrawing agents are provided. Modifying the ratio of one reactive metal complex to the other and varying the current density can be used to vary the morphology the metal layer on the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.