Hybrid overlay target design for imaging-based overlay and scatterometry-based overlay
US11112369B2 · kind B2 · utility
6Cited by
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10Claims
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Assignee
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Key dates
| Filing date | Jun 1, 2018 |
| Grant date | Sep 7, 2021 |
| Priority date | — |
| Expiry date | May 7, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Designs for a hybrid overlay target design that includes a target area with both an imaging-based target and a scatterometry-based target are disclosed. The imaging-based overlay target design can include side-by-side grating structure. A scatterometry-based overlay target design at a different location in the target area can include grating-over-grating structure. A method of measuring the hybrid overlay target design and a system with both an imaging optical system and a scatterometry system for measuring the hybrid overlay target design are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.