Method and device for radio frequency impedance matching, and semiconductor processing apparatus
US11114281B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2020 |
| Grant date | Sep 7, 2021 |
| Priority date | — |
| Expiry date | Oct 26, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32155
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for radio frequency impedance matching includes performing frequency scanning matching using first n pulse phases of first m pulse periods as a frequency scanning stage, and from an (m+1)-th pulse period to an M-th pulse period, maintaining a frequency scanning parameter of a pulse phase corresponding to each frequency scanning stage of each pulse period. The radio frequency includes M pulse periods, each pulse period includes N pulse phases, M and N are integers greater than 1, m and n are integers greater than 0, m<M, n≤N, and i=1, 2, . . . , m. A start value of the frequency scanning parameter of each frequency scanning stage of an (i+1)-th pulse period is consistent with an end value of the frequency scanning parameter of each frequency scanning stage of the i-th pulse period. Accordingly, an end value of the frequency scanning parameter of each frequency scanning stage of an m-th pulse period matches a preset target value of the frequency scanning parameter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.