High-intensity external ion injector
US11116996B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 6, 2020 |
| Grant date | Sep 14, 2021 |
| Priority date | — |
| Expiry date | Jul 6, 2040 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61N2005/1087
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A high-intensity external ion injector can includes (a) an ion source defining a plasma chamber and including an aperture through which ions can escape the plasma chamber, (b) a microwave source configured to generate microwave radiation and direct the microwave radiation into the plasma chamber, (c) a gas source filled with a plasma-forming gas and configured to supply the plasma-forming gas to the plasma chamber, (d) a voltage source configured to apply a voltage to the plasma chamber, (e) an einzel triplet lens, (f) an ion focus positioned and configured to focus an ion beam exiting the aperture of the ion source through the einzel triplet lens, and (g) a periodic focusing structure positioned and configured to receive an ion beam exiting the einzel triplet lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.