Self-assembly composition for pattern formation and pattern forming method
US11117996B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2017 |
| Grant date | Sep 14, 2021 |
| Priority date | — |
| Expiry date | Feb 27, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/54
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
It is an object of the present invention to provide a self-assembly composition for pattern formation having a wide range of applicable pattern size and being capable of forming a favorable phase-separated structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by the following formula (103) and a structure represented by the following formula (104), and a polymerization unit (b) having a structure represented by the following formula (105), wherein the content rate of a sugar moiety in the block copolymer is 3% by mass or more and 80% by mass or less based on the total mass of the block copolymer:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.