Patent · US Active

In-situ generation of glass-like materials inside subterranean formation

US11124689B2 · kind B2 · utility

0Cited by
12References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 18, 2019
Grant dateSep 21, 2021
Priority date
Expiry dateOct 18, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K2208/10
  • WIPO fieldCivil engineering
  • WIPO sectorOther fields

Abstract

Systems and methods for forming a permanent plug in a subterranean formation include providing a solution of colloidal silica and pumping the colloidal silica into a bore of a subterranean well so that the colloidal silica penetrates pores of the subterranean formation. The colloidal silica within the pores of the subterranean formation is dehydrated to form a glass-like material within the pores of the subterranean formation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.