Plasma source and plasma generation apparatus using the same
US11127570B2 · kind B2 · utility
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2References
10Claims
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Key dates
| Filing date | Dec 14, 2018 |
| Grant date | Sep 21, 2021 |
| Priority date | — |
| Expiry date | Dec 14, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/327
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma source device includes a pair of divided electrodes including a first divided electrode and a second divided electrode spaced apart from each other and electrically coupled to each other; and a ferrite structure comprising a portion interposed the first divided electrode and the second divided electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.