Method and apparatus for forming pattern on imprint material
US11131924B2 · kind B2 · utility
1Cited by
2References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 24, 2019 |
| Grant date | Sep 28, 2021 |
| Priority date | — |
| Expiry date | Dec 25, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for forming a pattern of an imprint material on a shot region of a substrate by using a mold, includes determining a plurality of marks for alignment of the shot region and the mold, performing measurement for the alignment using the plurality of marks determined in the determining, setting an origin position of a coordinate system for acquisition of an alignment error between the shot region and the mold based on an arrangement of the plurality of marks determined in the determining, and acquiring the alignment error based on a measurement result in the measurement and the origin position determined in the setting.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.