Process discharge gas polluted material removal device with regenerating means of polluted oxidation catalyst
US11135550B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2016 |
| Grant date | Oct 5, 2021 |
| Priority date | — |
| Expiry date | Oct 9, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/584
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process discharge gas polluted material removal device with a regenerating means of a polluted oxidation catalyst includes: an oxidation catalyst tower connected to a pipe circulating a process discharge gas including a combustible material, an organic material, an inorganic material, and nitrogen oxide and having a first temperature and having an oxidation catalyst embedded therein, the oxidation catalyst oxidizing and removing the combustible material; and a plasma reactor connected to the oxidation catalyst tower in front of the oxidation catalyst, generating a synthesis gas including hydrogen and having a high temperature of 300° C. or more by a plasma reaction, and supplying the synthesis gas including the hydrogen to the oxidation catalyst to regenerate the oxidation catalyst poisoned by the organic material and the inorganic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.