Surface-relief grating with patterned refractive index modulation
US11137603B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 20, 2019 |
| Grant date | Oct 5, 2021 |
| Priority date | — |
| Expiry date | Jun 20, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0178
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Techniques disclosed herein relate generally to surface-relief structures. In one embodiment, a surface-relief grating includes a plurality of grating ridges. The plurality of grating ridges includes a first set of grating ridges characterized by a first refractive index, and a second set of grating ridges interleaved with the first set of grating ridges and characterized by a second refractive index different from the first refractive index. The plurality of grating ridges is imprinted in a polymer layer by a nanoimprint lithography process and is exposed to a light pattern to form the first set of grating ridges and the second set of grating ridges that have different refractive indices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.