Guided allocation in an apparel management system
US11140936B2 · kind B2 · utility
6Cited by
0References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 27, 2019 |
| Grant date | Oct 12, 2021 |
| Priority date | — |
| Expiry date | Feb 27, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system allows a user to create new designs for apparel and preview these designs before manufacture. Software and lasers are used in finishing apparel to produce a desired wear pattern or other design. The system guides how the user is allocating apparel items in the system, including feedback on what the user may like to change.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.