Composition and method for manufacturing device using same
US11142495B2 · kind B2 · utility
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3References
15Claims
0Family size
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Key dates
| Filing date | Oct 13, 2017 |
| Grant date | Oct 12, 2021 |
| Priority date | — |
| Expiry date | Jun 30, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.