Patent · US Active

Method for depositing a coating by DLI-MOCVD with direct recycling of the precursor compound

US11142822B2 · kind B2 · utility

1Cited by

3References

21Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Frédéric SCHUSTER · Poissy, FR
Francis Maury · Mimizan, FR
Alexandre MICHAU · Toulouse, FR
Michel Pons · Vence, FR
Raphaël Boichot · Domène, FR
Fernando Lomello · Gif-sur-Yvette, FR

Key dates

Filing date	Oct 31, 2019
Grant date	Oct 12, 2021
Priority date	—
Expiry date	Oct 31, 2039

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/4412
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Process for the chemical vapor deposition by DLI-MOCVD on a substrate of a protective coating composed of at least one protective layer comprising a transition metal M:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.