Cleaning method and cleaning system for reticle pod
US11143974B1 · kind B1 · utility
2Cited by
10References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2020 |
| Grant date | Oct 12, 2021 |
| Priority date | — |
| Expiry date | Sep 15, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67359
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of cleaning a reticle pod and an exposure method, the method of cleaning the reticle pod including receiving the reticle pod that includes an inner pod and an outer pod surrounding the inner pod; disassembling the inner pod from the outer pod; inspecting a surface of a base plate of the inner pod to detect defects; performing a local plasma cleaning process at a defect location on the surface of the base plate; performing a wet cleaning process on the inner pod; and reassembling the inner pod to the outer pod.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.