Chitosan-containing antiperspirant cosmetic agents which are free of halides and/or hydroxy halides of aluminum and/or zirconium

US11154485B2 · kind B2 · utility

Assignee

• Henkel AG & Co. KGaA · DE

Inventors

• Bernhard Banowski · Goldkronach, DE
• Stefan Evers · Mettmann, DE
• Marcus Claas · Hilden, DE

Key dates

• Filing date: Apr 2, 2019
• Grant date: Oct 26, 2021
• Expiry date: Apr 2, 2039

Classification

• Technology area (CPC A): Human Necessities
• CPC primary: A61K2800/882
• WIPO field: Pharmaceuticals
• WIPO sector: Chemistry

Abstract

The invention relates to an antiperspirant cosmetic agent which includes at least one specific chitosan and which is free of aluminum-containing compounds, in particular free of halides and/or hydroxy halides of aluminum and/or zirconium. The present invention further relates to the use of a specific chitosan and to a non-therapeutic method for reducing body perspiration. Adding or using the at least one specific chitosan ensures that the sweat gland(s) is/are effectively influenced, thus resulting in a significant reduction in underarm perspiration even in the absence of antiperspirant aluminum-containing compounds.