Quantum dot material and method of curing
US11155728B2 · kind B2 · utility
2Cited by
1References
22Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 6, 2019 |
| Grant date | Oct 26, 2021 |
| Priority date | — |
| Expiry date | Dec 6, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D133/06
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Print materials described herein include a first polymerization initiator comprising an initiator material having a thermal decomposition rate and a peak photo-initiated decomposition rate, wherein the thermal dissociation rate is higher than the peak photo-initiated decomposition rate; a vinylic monomer; a polyfunctional monomer; scattering particles; and quantum dots. Methods of making a quantum dot material using such print materials, and of incorporating into light emitting devices, are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.