Patent · US Active

System and method for switching between an EUV pellicle and an optical pellicle

US11156927B1 · kind B1 · utility

0Cited by
1References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 24, 2018
Grant dateOct 26, 2021
Priority date—
Expiry dateJul 25, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70991
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A system for switching between an optical pellicle and an EUV pellicle includes one or more inspection tools configured to perform one or more inspection processes on a mask. The system includes one or more extreme ultraviolet (EUV) lithography tools configured to perform one or more lithographic exposures on the mask. The system includes a dual pellicle handler operatively coupled to the one or more inspection tools and the one or more EUV lithography tools, wherein the dual pellicle handler is configured to attach at least one of an optical pellicle or an EUV pellicle to the mask, wherein the dual pellicle handler is configured to detach at least one of the optical pellicle or the EUV pellicle from the mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.