Patent · US Active

Method for manufacturing substrate and liquid ejection head substrate

US11161344B2 · kind B2 · utility

0Cited by
0References
9Claims
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Assignee

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Key dates

Filing dateSep 24, 2019
Grant dateNov 2, 2021
Priority date
Expiry dateJan 20, 2040

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T156/1111
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A method for manufacturing a substrate having a resin layer, including, in this order: (1) providing the resin layer formed on a support, the support being larger than the outer size of the substrate; (2) bonding the resin layer supported on the support to the substrate; (3) removing an end portion of the resin layer disposed on the end portion of the support and in no contact with the substrate, by a solvent capable of dissolving the resin layer; and (4) peeling off the support from the resin layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.