Systems and methods for reactive gas-based product treatment
US11166481B2 · kind B2 · utility
1Cited by
4References
9Claims
0Family size
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Key dates
| Filing date | Oct 27, 2020 |
| Grant date | Nov 9, 2021 |
| Priority date | — |
| Expiry date | Oct 27, 2040 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA23V2002/00
- WIPO fieldFood chemistry
- WIPO sectorChemistry
Abstract
Systems and methods disclosed herein provide an improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse effects on quality. The system is operationally efficient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, the system obviates the need for further containerization or packaging of product during pasteurization processing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.