Patent · US Active

Small gap device system and method of fabrication

US11170984B2 · kind B2 · utility

2Cited by
3References
20Claims
0Family size

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Key dates

Filing dateJul 24, 2018
Grant dateNov 9, 2021
Priority date
Expiry dateMay 13, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J45/00
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A small-gap device system, preferably including two or more electrodes and one or more spacers maintaining a gap between two or more of the electrodes. A spacer for a small-gap device system, preferably including a plurality of legs defining a mesh structure. A method of spacer and/or small-gap device fabrication, preferably including: defining lateral features, depositing spacer material, selectively removing spacer material, separating the spacer from a fabrication substrate, and/or assembling the small-gap device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.