Nanostructures fabricated by metal asisted chemical etching for antibactertial applications
US11172680B2 · kind B2 · utility
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5Claims
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Key dates
| Filing date | Mar 11, 2019 |
| Grant date | Nov 16, 2021 |
| Priority date | — |
| Expiry date | Mar 11, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32134
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The method comprises contacting a silicon substrate with a silver salt and an acid for a time effective to produce spikes having a first end disposed on the silicon substrate and a second end extending away from the silicon substrate. The spikes have a second end diameter of about 10 nm to about 200 nm, a height of about 100 nm to 10 micrometers, and a density of about 10 to 100 per square microns. The nanostructures provide antimicrobial properties and can be transferred to the surface of various materials such as polymers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.