Curable composition for use in a high temperature lithography-based photopolymerization process and method of producing crosslinked polymers therefrom
US11174338B2 · kind B2 · utility
61Cited by
172References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 3, 2019 |
| Grant date | Nov 16, 2021 |
| Priority date | — |
| Expiry date | May 23, 2039 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.