Optical distortion reduction in projection systems
US11175487B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 26, 2020 |
| Grant date | Nov 16, 2021 |
| Priority date | — |
| Expiry date | Mar 26, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B15/177
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Techniques are disclosed for optical distortion reduction in projection systems for scanning projection and/or lithography. A projection system includes an illumination system configured to generate illumination radiation for generating an image of an object to be projected onto an image plane of the projection system. The illumination system includes a field omitting illumination condenser configured to receive the illumination radiation from a radiation source and provide a patterned illumination radiation beam to generate the image of the object, wherein the patterned illumination radiation beam comprises an omitted illumination portion corresponding to a ridge line of a roof prism disposed within an optical path of the projection system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.