Vertically-aligned carbon nanotube substrate having increased surface area
US11186732B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 13, 2017 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | May 17, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/95
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for manufacturing a vertically aligned carbon nanotube substrate includes the steps of treating a vertically aligned carbon nanotube array in an untreated state with a plasma to generate a vertically aligned carbon nanotube array in a plasma-treated state and adhering a coating onto at least a portion of the vertically aligned carbon nanotube array in the plasma-treated state to generate a vertically aligned carbon nanotube array in a coated state. The step of treating can include exposing the vertically aligned carbon nanotube substrate in the untreated state to the plasma in a plasma chamber. The step of adhering can include using a process of thermal evaporation or e-beam ablation. The method can also include the step of adhering a plurality of fluorophores to at least a portion of the vertically aligned carbon nanotube array in the coated state.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.