Rotation rate sensor, method for manufacturing a rotation rate sensor
US11187528B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 8, 2018 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | Oct 15, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2203/058
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A rotation rate sensor including a substrate, a drive structure, which is movable with regard to the substrate, a detection structure, and a Coriolis structure, the drive structure, the Coriolis structure, and the detection structure being essentially situated in a layer, in that an additional layer is situated essentially in parallel to the layer above or underneath the layer, a mechanical connection between the Coriolis structure and the drive structure being established with a first spring component, the first spring component being configured as a part of the additional layer, and/or a mechanical connection between the detection structure and the substrate being established with a second spring component, the second spring component being configured as a part of the additional layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.