Patent · US Active

Electron source and electron gun

US11189453B2 · kind B2 · utility

1Cited by

10References

17Claims

0Family size

Assignee

38TH RESEARCH INSTITUTE, CHINA ELECTRONICS TECHNOLOGY GROUP CORPORATION · CN

Inventors

Huarong Liu · Daguantang, CN
Junting Wang · Changchun, CN
Xuehui WANG · Meekrap-oord, CN
Yuxuan Qi · Daguantang, CN
Xianbin Hu · Meekrap-oord, CN
Xueming Jin · Meekrap-oord, CN
Zhao Huang · Meekrap-oord, CN
Dizhi Chen · Meekrap-oord, CN
Yijing Li · Daguantang, CN
Youyin Deng · Meekrap-oord, CN

Key dates

Filing date	Dec 26, 2018
Grant date	Nov 30, 2021
Priority date	—
Expiry date	Dec 26, 2038

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0635
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The present disclosure provides an electron source, including one or more tips, wherein at least one of the tips comprises one or more fixed emission sites, wherein at least one of the tips includes one or more fixed emission sites, wherein the emission sites includes a reaction product of metal atoms on a surface of the tip with gas molecules.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.