Patent · US Active

Method for manufacturing array substrate, array substrate and display apparatus

US11189641B2 · kind B2 · utility

0Cited by
1References
13Claims
0Family size

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Key dates

Filing dateJul 5, 2018
Grant dateNov 30, 2021
Priority date
Expiry dateJul 5, 2038

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02F2203/02
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

An array substrate, a manufacturing method thereof, and a display apparatus are provided. The array substrate includes a display area and a non-display area in the periphery of the display area, the display area includes pixel regions, the display and non-display areas are provided with via holes, wherein each pixel region is provided, at a side facing a display side, with a reflection layer configured to reflect light irradiated thereon from an external light source to form a display image; and an anti-deterioration layer in contact with the reflection layer is provided in the via holes in the display and non-display areas. Thus, by using a new material, utilization of external light source is improved without additional masking process, and connection in via holes in the display area, and especially in the non-display area is achieved, which prevents deterioration of the via holes and poor contact resistance.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.