Structure, color filter, solid-state imaging element, image display device, method for producing structure, and composition for forming organic material layer
US11189652B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2019 |
| Grant date | Nov 30, 2021 |
| Priority date | — |
| Expiry date | Aug 8, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/024
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Provided are a structure having excellent moisture resistance, a color filter, a solid-state imaging element, an image display device, and a method for producing a structure. Provided is also a composition for forming an organic material layer which is used to form the above-mentioned structure. This structure 100 has a support 1, partition walls 2 formed on the support 1, colored layers 4 formed in regions partitioned by the partition walls 2, on the support 1, and organic material layers 3 formed using a composition including a compound having a group with an ethylenically unsaturated bond, between the partition walls 2 and the colored layers 4.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.