Patent · US Active

System and method for laser marking substrates

US11192389B2 · kind B2 · utility

0Cited by

2References

21Claims

0Family size

Assignee

Alltec Angewandte Laserlicht Technologie GmbH · DE

Inventors

Peter J. Kueckendahl · Bad Oldesloe, DE
Daniel J. Ryan · Sycamore, US

Key dates

Filing date	Dec 1, 2017
Grant date	Dec 7, 2021
Priority date	—
Expiry date	Dec 5, 2038

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB41J2/44
WIPO fieldTextile and paper machines
WIPO sectorMechanical engineering

Abstract

A laser marking system comprises at least one controller to control an array of optical devices, between a laser source and a scan head. The array applies a selected pattern of portions of the received spatial profile of the laser beam to the substrate to achieve a second intensity different from the first intensity of laser beam at a rate of power deposition relative to a rate of thermal diffusion in the substrate for a predetermined time interval to thermally heat locations of the substrate with the selected pattern of the portions. The second intensity effectuates carbonization of materials of the substrate to create a mark without ablation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.