Silicon-based optical antenna with reflective layer and preparation method therefor

US11194099B2 · kind B2 · utility

Assignee

• VANJEE TECHNOLOGY CO., LTD. · CN

Inventors

• Pengfei Wang · Shanghai, CN
• Yang Xu · Wenhe, CN
• Zhaosong Li · 红钢城街道, CN
• Zhibo Li · 东风镇, CN
• Yejin Zhang · Beijing, CN
• Hongyan Yu · Beijing, CN
• Jiaoqing Pan · Beijing, CN
• Qingfei Wang · Beijing, CN
• Linyan Tian · Beijing, CN

Key dates

• Filing date: Mar 20, 2020
• Grant date: Dec 7, 2021
• Expiry date: Apr 23, 2040

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B2006/12107
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Embodiments of the present disclosure provide a silicon-based optical antenna with a reflective layer and a preparation method therefor. The silicon-based optical antenna comprises: an SOI substrate, the SOI substrate at least comprises a bottom silicon layer, a buried oxide layer, and a top silicon layer, the buried oxide layer is located between the bottom silicon layer and the top silicon layer, the top silicon layer is etched to form a row of waveguides, spacings between the waveguides in the row of the waveguides are in an uneven distribution, each waveguide of the row of the waveguides is etched with gratings, the bottom silicon layer is formed with a groove directly reaching a surface of the buried oxide layer facing the bottom silicon layer, and the surface of the buried oxide layer in the groove is formed with a metal reflective layer.