Image distance sensor and manufacture method thereof as well as a ranging device
US11195868B2 · kind B2 · utility
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1References
12Claims
0Family size
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Key dates
| Filing date | Jun 14, 2019 |
| Grant date | Dec 7, 2021 |
| Priority date | — |
| Expiry date | Sep 30, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8027
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
This disclosure provides an image distance sensor and a manufacture method thereof, as well as a ranging device. The image distance sensor includes a semiconductor substrate, and an image sensing unit and a distance sensing unit formed on the semiconductor substrate. The image sensing unit and the distance sensing unit are formed in a same manufacture process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.