Patent · US Active

Graphene structure and method for manufacturing graphene having wrinkle pattern

US11198612B2 · kind B2 · utility

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5Claims
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Key dates

Filing dateDec 10, 2018
Grant dateDec 14, 2021
Priority date
Expiry dateDec 17, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01P2004/90
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A method for manufacturing graphene having a wrinkle pattern is provided. The method includes forming a wrinkle providing layer having a first thermal expansion coefficient on one surface of a graphene layer, forming a substrate having a second thermal expansion coefficient on one surface of the wrinkle providing layer, and performing a heat treatment to form wrinkles on the wrinkle providing layer by a difference between the first and second thermal expansion coefficients, thereby forming wrinkle patterns on the graphene layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.