Display device including a trench and manufacturing method thereof
US11201197B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2019 |
| Grant date | Dec 14, 2021 |
| Priority date | — |
| Expiry date | Jul 30, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K59/38
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A display device includes: a substrate; a plurality of pixels on the substrate; an insulating film on the substrate; a bank on the insulating film, wherein the bank partitions the plurality of pixels; a first trench in the bank; and a second trench in the insulating film. A method of manufacturing a display device includes: forming a first lower metal layer and a second metal layer in patterns on a substrate; forming a first insulating film on the first lower metal layer and the second lower metal layer; forming a second insulating film on the first insulating film; forming a first trench to expose the second lower metal layer by performing a first etching process; and forming a second trench by performing a second etching process to etch the second lower metal layer exposed from a bottom of the first trench.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.