Methods and systems for photo-curing photo-sensitive material for printing and other applications
US11203156B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 20, 2018 |
| Grant date | Dec 21, 2021 |
| Priority date | — |
| Expiry date | May 20, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29C64/135
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and systems for forming objects through photo-curing of a liquid resin in a tank by selective exposure (through a mask) to radiation, in which during printing operations the liquid resin in the tank is displaced relative to the build area along an axis orthogonal to that along which the object is extracted from the liquid resin in the tank. A volume of the photo-curing liquid resin may be cycled through a cooling arrangement by being extracted from the tank, cooled, and then reintroduced into the tank as printing of the object is taking place. The mask is preferably one in which charged colorant particles are dispersed in an optically transparent fluid within a plurality of bi-state cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.