Silicon-based display panel, forming method thereof, and photomask assembly for exposure process of silicon-based display panel
US11205767B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 2019 |
| Grant date | Dec 21, 2021 |
| Priority date | — |
| Expiry date | Apr 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/60
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A forming method for a silicon-based display panel includes providing a silicon substrate having a display region and a peripheral region surrounding the display region, providing a first set of photomasks corresponding to the display region, using the first set of photo masks in an exposure process of the display region, providing a second set of photomasks corresponding to the peripheral region, and using the second set of photomasks in an exposure process of the peripheral region. The exposure process of the display region and the exposure process of the peripheral region are different process steps. According to the forming method for the silicon-based display panel, splicing of pixel patterns in the display region is not carried out, so that the yield and the display effect are improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.