Patent · US Active

Mask and method of manufacturing mask assembly including the same

US11207705B2 · kind B2 · utility

7Cited by
8References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 12, 2020
Grant dateDec 28, 2021
Priority date
Expiry dateMar 12, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/233
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.