System for applying a masking material to a substrate
US11207706B2 · kind B2 · utility
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3References
16Claims
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Assignee
Inventors
Key dates
| Filing date | Feb 16, 2018 |
| Grant date | Dec 28, 2021 |
| Priority date | — |
| Expiry date | Aug 18, 2038 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B13/0452
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Systems for applying a masking material to a substrate, the system comprising: a source feed for delivering a quantity of masking material to a substrate, a waste deposit for receiving masking material when removed from the substrate, a spray nozzle moveable relative to the substrate and a controller for controlling movement of the nozzle relative to the substrate and the speed of delivery of the masking material from the source feed, wherein the speed of movement of the spray nozzle relative to the substrate is substantially equal to the speed of delivery of the masking material from the source feed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.