Deposition mask device and method of manufacturing deposition mask device
US11211558B2 · kind B2 · utility
3Cited by
1References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2019 |
| Grant date | Dec 28, 2021 |
| Priority date | — |
| Expiry date | Jun 12, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/621
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vapor deposition mask device includes a vapor deposition mask having an effective region in which a plurality of first through holes is disposed, and a frame attached to the vapor deposition mask. The vapor deposition mask device includes a plurality of joint portions that joins the vapor deposition mask and the frame to each other. The plurality of joint portions is arranged along the outer edge of the vapor deposition mask. A notch is formed at a position corresponding to between two adjacent joint portions in the outer edge of the vapor deposition mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.