Imprinting apparatus
US11213976B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 19, 2017 |
| Grant date | Jan 4, 2022 |
| Priority date | — |
| Expiry date | Jul 24, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D4/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.