Patent · US Active

Direct graphene transfer and graphene-based devices

US11214491B2 · kind B2 · utility

1Cited by

3References

14Claims

0Family size

Assignees

CORNING INCORPORATED · US
ICFO—THE INSTITUTE OF PHOTONIC SCIENCES · ES
INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANCATS · ES

Inventors

Therese Francoise Arliguie · Corning, US
Theresa Chang · Riverside, US
Miriam Marchena Martín-Francés · Barcelona, ES
Prantik Mazumder · Ithaca, US
Valerio Pruneri · Barcelona, ES
Frederic Christian Wagner · Horseheads, US

Key dates

Filing date	Nov 16, 2018
Grant date	Jan 4, 2022
Priority date	—
Expiry date	Nov 16, 2038

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC01B2204/22
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of forming a functionalized device substrate is provided that includes the steps of: forming a graphene layer on a growth substrate; applying a polyimide layer to a glass, glass-ceramic or ceramic substrate, wherein a coupling agent couples the polyimide layer to the said substrate; coupling the polyimide layer to the graphene layer on the growth substrate; and peeling the growth substrate from the graphene layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.