Chemical vapor deposition system including ground strap bar
US11214870B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 25, 2018 |
| Grant date | Jan 4, 2022 |
| Priority date | — |
| Expiry date | Jan 24, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01R9/16
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.