Charged particle beam system and method of measuring sample using scanning electron microscope
US11217422B2 · kind B2 · utility
1Cited by
0References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2020 |
| Grant date | Jan 4, 2022 |
| Priority date | — |
| Expiry date | Jan 29, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/24578
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
First shape data representing a three-dimensional shape of a sample unit including a sample is generated based on a result of three-dimensional shape measurement of the sample. Second shape data representing a three-dimensional shape of a structure which exists in a sample chamber is generated. Movement of the sample unit is controlled based on the first shape data and the second shape data such that collision of the sample unit with the structure does not occur.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.