Method for depositing a CdTe layer on a substrate

US11217720B2 · kind B2 · utility

Assignees

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE
• CTF Solar GmbH · DE

Inventors

• Henry Morgner · Dresden, DE
• Christoph Metzner · Dresden, DE
• Daniel Hirsch · Dresden, DE
• Olaf Zywitzki · Freiberg, DE
• Ludwig Decker · Dresden, DE
• Torsten Werner · Dresden, DE
• Bastian Siepchen · Dresden, DE
• Bettina Späth · Dresden, DE
• Krishnakumar Velappan · Dresden, DE
• Christian Kraft · Dresden, DE
• Christian Drost · Dresden, DE

Key dates

• Filing date: Feb 3, 2017
• Grant date: Jan 4, 2022
• Expiry date: Feb 3, 2037

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02E10/50
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method for depositing a CdTe layer on a substrate in a vacuum chamber by means of physical gas phase deposition is provided. The substrate is heated to a coating temperature before the deposition process and then guided past a vessel in which CdTe is converted into a vapour state, a gaseous component with an increased pressure (compared to the vacuum in the vacuum chamber) flowing through at least one inlet, against the substrate surface to be coated, such that the gaseous component is adsorbed on the substrate surface to be coated before the substrate is guided past the at least one vessel.