Patent · US Active

Silicon cavity backed radiator structure

US11217874B2 · kind B2 · utility

0Cited by
4References
27Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 18, 2020
Grant dateJan 4, 2022
Priority date
Expiry dateMar 18, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01Q9/16
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

One embodiment is an apparatus comprising a silicon-on-insulator (“SOI”) substrate comprising an insulating layer sandwiched in between a bottom silicon layer and a top silicon layer; a radiating element disposed on a top surface of the SOI substrate; and at least one cavity disposed in the SOI substrate surrounding the radiating element, wherein the at least one cavity extends from a bottom surface of the bottom silicon layer to a bottom surface of the insulating layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.