Polymer, hardmask composition, and method of forming patterns
US11220570B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Dec 23, 2019 |
| Grant date | Jan 11, 2022 |
| Priority date | — |
| Expiry date | Mar 12, 2040 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A polymer, a hardmask composition, and a method of forming patterns, the polymer including structural units obtained by a reaction of a reaction mixture that includes a substituted or unsubstituted indole compound, a first aromatic aldehyde compound including a substituted or unsubstituted C3 to C20 branched alkyl group thereon, and a second aromatic aldehyde compound that is different from the first aromatic aldehyde compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.