Method and system for measuring refraction, method for the optical design of an ophthalmic lens, and pair of glasses comprising such an ophthalmic lens
US11224338B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2017 |
| Grant date | Jan 18, 2022 |
| Priority date | — |
| Expiry date | Sep 4, 2038 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/103
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Disclosed is a method for measuring the refraction of an individual by a refraction measuring appliance, including: an initial step of determining at least one initial value of a visuo-postural parameter of the individual; a step of processing the initial value in order to deduce at least one initial value of a regulating parameter of the refraction measuring appliance, the regulating parameter being associated with the visuo-postural parameter; a step of regulating the refraction measuring appliance according to the initial value of the regulating parameter; and a step of measuring the refraction of the individual by the measuring appliance regulated in this way. Also disclosed is a method for the optical design of an ophthalmic lens, and to a pair of glasses including such a lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.