Stereolithography apparatus material provision device
US11225021B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2019 |
| Grant date | Jan 18, 2022 |
| Priority date | — |
| Expiry date | Jul 17, 2039 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB33Y30/00
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
In a stereolithography apparatus a material provision device for print material (16) to be cured, in particular a photopolymer, is provided. The material provision device (10) receives a material cartridge (12) which in turn receives the print material (16) and surrounds it on all sides. The material cartridge (12) may be connected to an outlet valve unit (20) in a liquid-proof manner via which the print material (16) may be output and which is received at least partially in the material provision device (10) and which is supported at least partially thereon or therein or sealed against it. The outlet valve unit (20) comprises a valve (100) which is opened and closed depending on the relative position, in particular the swiveling position, of material provision device (10) and stereolithography apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.