Patent · US Active

Marking method

US11227969B2 · kind B2 · utility

0Cited by

0References

7Claims

0Family size

Assignee

Azur Space Solar Power GmbH · DE

Inventors

Wolfgang KOESTLER · Heilbronn, DE
Steffen SOMMER · Tamm, DE
Alexander Frey · Lappersdorf, DE

Key dates

Filing date	Aug 31, 2020
Grant date	Jan 18, 2022
Priority date	—
Expiry date	Sep 18, 2040

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P70/50
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A marking method for applying a unique identification to each individual solar cell stack of a semiconductor wafer, at least comprising the steps: Providing a semiconductor wafer having an upper side and an underside, which comprises a Ge substrate forming the underside; and generating an identification with a unique topography by means of laser ablation, using a first laser, on a surface area of the underside of each solar cell stack of the semiconductor wafer, the surface area being formed in each case by the Ge substrate or by an insulating layer covering the Ge substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.